Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session WF2: Magnetron Sputter Deposition
3:30 PM–5:15 PM,
Friday, October 16, 2015
Room: 308 AB
Chair: Yuichi Setsuhara, Osaka University
Abstract ID: BAPS.2015.GEC.WF2.5
Abstract: WF2.00005 : Study of the mechanical properties and the microstructure of magnetron sputtered MoBC coatings*
4:45 PM–5:00 PM
Preview Abstract Abstract
Authors:
Vilma Bursikova
(Department of Physical Electronics, Faculty of Science, Masaryk University)
Pavel Soucek
(Department of Physical Electronics, Faculty of Science, Masaryk University)
Petr Vasina
(Department of Physical Electronics, Faculty of Science, Masaryk University)
Lukas Zabransky
(Department of Physical Electronics, Faculty of Science, Masaryk University)
Jiri Bursik
(Institute of Physics of Materials, Academy of Sciences of the Czech Republic)
*The research was supported by Czech Science Foundation (project 15-17875S), by European Regional Development Fund (project CZ.1.05/2.1.00/03.0086) and by Ministry of Education Youth and Sports of Czech Republic (project LO1411 (NPU I)).
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.WF2.5
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