Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session WF2: Magnetron Sputter Deposition
3:30 PM–5:15 PM,
Friday, October 16, 2015
Room: 308 AB
Chair: Yuichi Setsuhara, Osaka University
Abstract ID: BAPS.2015.GEC.WF2.2
Abstract: WF2.00002 : Applying Composition Control to Enhance the Mechanical and Thermal Properties of Zr-Cu-Ni-Al-N Thin Film Metallic Glass
4:00 PM–4:15 PM
Preview Abstract Abstract
Authors:
Joseph Lee
(National Tsing-Hua University)
Jenq-Gong Duh
(National Tsing-Hua University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.WF2.2
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700