Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session TF3: Applications of Plasmas
10:00 AM–12:00 PM,
Friday, October 16, 2015
Room: 305 AB
Chair: Hirotaka Toyoda, Nagoya University
Abstract ID: BAPS.2015.GEC.TF3.1
Abstract: TF3.00001 : Plasmas and Nanostructures for Energy Applications
10:00 AM–10:30 AM
Preview Abstract
Abstract
Author:
Sylvain Coulombe
(Plasma Processing Laboratory, Department of Chemical Engineering, McGill University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.TF3.1
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