Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session LW1: Poster Session II (4:00pm - 6:00pm)
4:00 PM,
Wednesday, October 14, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.LW1.93
Abstract: LW1.00093 : Organic Decomposition Performance of In-line Liquid Treatment System Using Microwave Plasma
Preview Abstract
Abstract
Authors:
Michiko Ito
(Nagoya University, Plasma Center for Industrial Applications)
Seigo Takashima
(Plasma Center for Industrial Applications)
Norio Nomura
(Sanshin Mfg. Co., Ltd)
Tominori Nomura
(Sanshin Mfg. Co., Ltd)
Hirotaka Toyoda
(Nagoya University, Plasma Nanotechnology Research Center)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.LW1.93
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700