Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session LW1: Poster Session II (4:00pm - 6:00pm)
4:00 PM,
Wednesday, October 14, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.LW1.178
Abstract: LW1.00178 : Atmospheric Pressure Micro-Thermal-Plasma-Jet Crystallization of Amorphous Silicon Strips for High-Performance Thin Film Transistor Fabrication*
Preview Abstract Abstract
Authors:
Seiji Morisaki
(Graduate School of Advanced Sciences of Matter, Hiroshima University)
Taichi Nakatani
(Graduate School of Advanced Sciences of Matter, Hiroshima University)
Ryota Shin
(Graduate School of Advanced Sciences of Matter, Hiroshima University)
Seiichiro Higashi
(Graduate School of Advanced Sciences of Matter, Hiroshima University)
*Part of this work was supported by the Research Institute for Nanodevice and Bio Systems (RNBS), Hiroshima University.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.LW1.178
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