Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session LW1: Poster Session II (4:00pm - 6:00pm)
4:00 PM,
Wednesday, October 14, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.LW1.131
Abstract: LW1.00131 : Ratio of Cu, Zn, Sn and S densities in magnetron sputtering plasmas employing a stoichiometric Cu$_2$ZnSnS$_4$ target
Preview Abstract Abstract
Authors:
Nayan Nafarizal
(Hokkaido University \& Universiti Tun Hussein Onn Malaysia)
Koichi Sasaki
(Hokkaido University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.LW1.131
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