Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session KW1: Plasma Gas Conversion
1:30 PM–3:45 PM,
Wednesday, October 14, 2015
Room: 301 B
Chair: Osamu Sakai, University of Shiga Prefecture
Abstract ID: BAPS.2015.GEC.KW1.8
Abstract: KW1.00008 : Development of High-speed and Environmentally Friendly Photoresist Removal Process using Pulsed Microwave Plasma in Water Vapor
3:30 PM–3:45 PM
Preview Abstract Abstract
Authors:
Tatsuo Ishijima
(Kanazawa University)
Takuya Kitano
(Kanazawa University)
Takuya Ito
(Kanazawa University)
Hiroaki Suzuki
(Kanazawa University)
Yasunori Tanaka
(Kanazawa University)
Yoshihiko Uesugi
(Kanazawa University)
Takashi Nishiyama
(Osaka City University)
Hideo Horibe
(Osaka City University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.KW1.8
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700