Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session GT1: Poster Session I (4:00pm - 6:00 pm)
4:00 PM,
Tuesday, October 13, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.GT1.146
Abstract: GT1.00146 : Preparation of mixed metal thin films by a PVD method using several kinds of powder targets
Preview Abstract
Abstract
Authors:
Yoshiaki Suda
(National Institute of Technology, Sasebo College)
Hiroharu Kawasaki
(National Institute of Technology, Sasebo College)
Tamiko Ohshima
(National Institute of Technology, Sasebo College)
Yoshihito Yagyu
(National Institute of Technology, Sasebo College)
Takeshi Ihara
(National Institute of Technology, Sasebo College)
Makiko Yamauchi
(National Institute of Technology, Sasebo College)
Collaboration:
Plasma process and application
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.GT1.146
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