Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session GT1: Poster Session I (4:00pm - 6:00 pm)
4:00 PM,
Tuesday, October 13, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.GT1.132
Abstract: GT1.00132 : Many flaked particles generated by electric field stress working as an impulsive force in mass-production plasma etching equipment*
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Abstract
Authors:
Yuji Kasashima
(National Institute of Advanced Industrial Science and Technology (AIST))
Fumihiko Uesugi
(National Institute of Advanced Industrial Science and Technology (AIST))
*This work was partially supported by JSPS KAKENHI Grant Number B 26870903.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.GT1.132
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