Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session FT2: Inductively Coupled Plasmas
1:30 PM–3:30 PM,
Tuesday, October 13, 2015
Room: 308 AB
Chair: Earl Scime, West Virginia University
Abstract ID: BAPS.2015.GEC.FT2.8
Abstract: FT2.00008 : Characterization of inductively coupled Ar and Ar/CH4 plasma using tuned single Langmuir probe and fluid simulation
3:15 PM–3:30 PM
Preview Abstract Abstract
Authors:
Ju-Hong Cha
(Department of Electrical and Computer Engineering, Pusan National University)
Moon-Ki Han
(Department of Electrical and Computer Engineering, Pusan National University)
Kwon-Sang Seo
(Department of Electrical and Computer Engineering, Pusan National University)
Dong-Hyun Kim
(Department of Electrical and Computer Engineering, Pusan National University)
Hae June Lee
(Department of Electrical and Computer Engineering, Pusan National University)
Ho-Jun Lee
(Department of Electrical and Computer Engineering, Pusan National University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.FT2.8
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