Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session DT2: Plasma Surface Interactions I
8:00 AM–9:45 AM,
Tuesday, October 13, 2015
Room: 308 AB
Chair: Toshihiko Iwao, Tokyo Electron, Inc.
Abstract ID: BAPS.2015.GEC.DT2.3
Abstract: DT2.00003 : Carrier transport and trapping in a-Si:H films under plasma processing
8:45 AM–9:00 AM
Preview Abstract Abstract
Authors:
Shota Nunomura
(National Institute of Advanced Industrial Science and Technology)
Isao Sakata
(National Institute of Advanced Industrial Science and Technology)
Koji Matsubara
(National Institute of Advanced Industrial Science and Technology)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.DT2.3
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