Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session LW1: Poster Session II (4:00pm - 6:00pm)
4:00 PM,
Wednesday, October 14, 2015
Room: Exhibit Hall III
Abstract ID: BAPS.2015.GEC.LW1.20
Abstract: LW1.00020 : Fluid simulation and experimental measurement of radical densities in capacitively coupled CF$_{4}$/Ar plasma*
Preview Abstract Abstract
Authors:
Ying-Shuang Liang
(Dalian University of Technology)
Yong-Xin Liu
(Dalian University of Technology)
Yu-Ru Zhang
(Dalian University of Technology)
Wen-Yao Liu
(Dalian University of Technology)
You-Nian Wang
(Dalian University of Technology)
*This work was supported by the National Natural Science Foundation of China (NSFC) (Grant Nos. 11335004, 11405018, 11405019) and the Important National Science and Technology Specific Project (Grant No. 2011ZX02403-001).
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.LW1.20
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2025 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700