65th Annual Gaseous Electronics Conference
Volume 57, Number 8
Monday–Friday, October 22–26, 2012;
Austin, Texas
Session Index
Session HW1: Plasma Sheaths II
Chair: Ralf Peter Brinkmann, Ruhr-Universit\"at Bochum
Room: Amphitheatre 204
Wednesday, October 24, 2012
8:00AM - 8:30AM
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HW1.00001: Plasma-Sheath Model
Invited Speaker:
Karl-Ulrich Riemann
Preview Abstract |
Wednesday, October 24, 2012
8:30AM - 8:45AM
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HW1.00002: Accuracy of the step sheath approximation
Mark Sobolewski
Preview Abstract |
Wednesday, October 24, 2012
8:45AM - 9:00AM
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HW1.00003: STUDENT AWARD FINALIST: A Kinetic Theory of Planar Plasma Sheaths Surrounding Electron Emitting Surfaces
J.P. Sheehan, Igor Kaganovich, Noah Hershkowitz, Yevgeny Raitses
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Wednesday, October 24, 2012
9:00AM - 9:15AM
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HW1.00004: Characteristics of Sheath and Presheath Recovery during Pulse Fall Time
Jae-Myung Choe, Kyoung-Jae Chung, Y.S. Hwang, Gon-Ho Kim
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Wednesday, October 24, 2012
9:15AM - 9:30AM
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HW1.00005: Numerical simulation of pulsed plasma sheath dynamics in an oblique magnetic field
Abolfazl Mahmoodpoor, Hamid Ghomi, Shahryar Mirpour
Preview Abstract |
Session HW2: Plasma Etching I
Chair: Makoto Sekine, Nagoya University, Japan
Room: Classroom 203
Wednesday, October 24, 2012
8:00AM - 8:30AM
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HW2.00001: Time-Multiplexed Deep Silicon Etching
Invited Speaker:
Lawrence Overzet
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Wednesday, October 24, 2012
8:30AM - 8:45AM
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HW2.00002: Formation Mechanisms of Surface Roughening and Rippling during Plasma Etching and Sputtering of Silicon
Hirotaka Tsuda, Yoshinori Takao, Koji Eriguchi, Kouichi Ono
Preview Abstract |
Wednesday, October 24, 2012
8:45AM - 9:00AM
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HW2.00003: Ion Energy Distribution Control Using Ion Mass Ratios in Inductively Coupled Plasmas With a Pulsed DC Bias on the Substrate
Michael D. Logue, Mark J. Kushner
Preview Abstract |
Wednesday, October 24, 2012
9:00AM - 9:15AM
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HW2.00004: Multi-scale approach for simulation of deep silicon etching under ICP SF6/Ar plasma mixture
Amand Pateau, Ahmed Rhallabi, Marie Claude Fernandez, Fabrice Roqueta, Mohamed Boufnichel
Preview Abstract |
Wednesday, October 24, 2012
9:15AM - 9:30AM
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HW2.00005: Molecular Dynamics Analysis of Physical and Chemical Behavior of Etch Products Desorbed during Si Etching in Cl- and Br-based Plasmas
Nobuya Nakazaki, Yoshinori Takao, Koji Eriguchi, Kouichi Ono
Preview Abstract |
Session HW3: Heavy Particle Collisions
Chair: Don Madison, Missouri University of Science and Technology
Room: Classroom 202
Wednesday, October 24, 2012
8:00AM - 8:30AM
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HW3.00001: Kinematically complete study on ion-impact induced ionization of laser-cooled lithium
Invited Speaker:
Daniel Fischer
Preview Abstract |
Wednesday, October 24, 2012
8:30AM - 8:45AM
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HW3.00002: Strong multiple-capture effect in slow Ar$^{17+}$-Ar collisions: a quantum mechanical analysis
Arash Salehzadeh, Tom Kirchner
Preview Abstract |
Wednesday, October 24, 2012
8:45AM - 9:00AM
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HW3.00003: Application of Neural Networks to Atomic and Molecular Collisions
A.L. Harris, J.A. Darsey
Preview Abstract |
Wednesday, October 24, 2012
9:00AM - 9:15AM
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HW3.00004: STUDENT AWARD FINALIST: Projectile Coherence Effects in Single and Dissociative Electron Capture in Collision of Protons with H$_{2}$ and He
Sachin Sharma, Ahmad Hasan, Kisra Egodapitiya, Thusitha Arthanayaka, Giorgi Sakhelashvili, Michael Schulz
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Wednesday, October 24, 2012
9:15AM - 9:30AM
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HW3.00005: Calculations for ion-impact induced ionization and fragmentation of water molecules
Tom Kirchner, Mitsuko Murakami, Marko Horbatsch, Hans J\"urgen L\"udde
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