Bulletin of the American Physical Society
64th Annual Gaseous Electronics Conference
Volume 56, Number 15
Monday–Friday, November 14–18, 2011; Salt Lake City, Utah
Session SF3: High Pressure Discharges III |
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Chair: Ute Ebert, Eindhoven University of Technology Room: 255F |
Friday, November 18, 2011 8:00AM - 8:30AM |
SF3.00001: Diagnostics of atmospheric pressure microplasma jets by means of molecular beam mass spectrometry Invited Speaker: The measurement of absolute densities of reactive species generated in the atmospheric pressure plasma jets is crucial for the understanding of the plasma physics and plasma chemistry involved and of the effects they induce during the surface treatment. However, these measurements are challenging due to high pressure and limited size of typical plasma jets. One of the techniques, which can be used for these measurements, is Molecular Beam Mass Spectrometry (MBMS). However, the collisional gas sampling into the low pressure mass spectrometer, which takes place by analysis of atmospheric pressure plasmas, has to be carefully considered and evaluated. The design and a calibration scheme of the MBMS system will be presented here and its capabilities will be demonstrated on the measurements of O and O$_{3}$ species in He/O$_{2}$ jet and on the analysis of plasma chemistry products generated in the He/HMDSO/O$_{2}$ microplasma jet. Additionally, the detection of ions in the plasma effluent and their relevance for the inactivation of vegetative bacteria will be discussed as well.\\[4pt] Work done in collaboration with Dirk Ellerweg, Ruediger Reuter, Katja Ruegner, Simon Schneider, and Achim von Keudell, Ruhr-University Bochum. [Preview Abstract] |
Friday, November 18, 2011 8:30AM - 9:00AM |
SF3.00002: Diagnostics of reactive pulsed plasmas by UV and VUV absorption spectroscopy and by modulated beam Mass spectrometry Invited Speaker: Pulsed plasmas are promising for etching applications in the microelectronic industry. However, many new phenomena are involved when a high density discharge is pulsed. To better understand these processes it is necessary to probe the radicals' kinetics with a microsecond resolution. We have developed several diagnostics to reach this goal including broad band absorption spectroscopy with UV LEDs to detect small polyatomic radicals and with a deuterium VUV source to detect larger closed shell molecules and the modulated mass spectrometry to monitor atomic species. We will discuss the impact of the plasma pulsing frequency and duty cycle on the radical densities in Cl2 based plasmas, and the consequences on plasma processes. [Preview Abstract] |
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