62nd Annual Gaseous Electronics Conference
Volume 54, Number 12
Tuesday–Friday, October 20–23, 2009;
Saratoga Springs, New York
Session Index
Session SR3: Plasma-Surface Interactions
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Chair: Song-yun Kang, Tokyo Electron Ltd
Room: Saratoga Hilton Ballroom 3
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Thursday, October 22, 2009
10:00AM - 10:30AM
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SR3.00001: Plasma surface interactions in fluorocarbon systems
Invited Speaker:
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Thursday, October 22, 2009
10:30AM - 10:45AM
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SR3.00002: Temperature Impact on Plasma-Surface Interactions in an FC Plasma Environment
Caleb Nelson, Iqbal Saraf, Lawrence Overzet, Matthew Goeckner
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Thursday, October 22, 2009
10:45AM - 11:00AM
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SR3.00003: SiO$_{2}$ Film Etching Process Using Environment-Friendly New Gas C$_{5}$F$_{7}$H
Yudai Miyawaki, Keigo Takeda, Azumi Ito, Masahiro Nakamura, Makoto Sekine, Masaru Hori
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Thursday, October 22, 2009
11:00AM - 11:15AM
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SR3.00004: Plasma-surface interactions during Si etching in Cl- and Br-based plasmas: An empirical and atomistic study
Hirotaka Tsuda, Tatsuya Nagaoka, Hiroki Miyata, Yoshinori Takao, Koji Eriguchi, Kouichi Ono
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Thursday, October 22, 2009
11:15AM - 11:30AM
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SR3.00005: Analysis of the surface reactions of ArF photoresist during fluorocarbon plasma etching by XPS
Takuya Takeuchi, Makoto Sekine, Hirotaka Toyoda, Keigo Takeda, Masaru Hori, Song-Yun Kang, Ikuo Sawada
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Thursday, October 22, 2009
11:30AM - 11:45AM
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SR3.00006: Determination of gas phase and surface reactions in plasma polymerization
Dirk Hegemann
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Thursday, October 22, 2009
11:45AM - 12:00PM
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SR3.00007: Role of plasma activation in the kinetics of CNT growth in PECVD process
Irina Lebedeva, Alexey Gavrikov, Alexey Baranov, Maxim Belov, Andrey Knizhnik, Boris Potapkin, Timothy Sommerer
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