Bulletin of the American Physical Society
62nd Annual Gaseous Electronics Conference
Volume 54, Number 12
Tuesday–Friday, October 20–23, 2009; Saratoga Springs, New York
Session HT1: Inductively Coupled Plasmas |
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Chair: Hirotaka Toyoda, Nagoya University Room: Saratoga Hilton Ballroom 1 |
Tuesday, October 20, 2009 1:30PM - 2:00PM |
HT1.00001: Electron heating in inductive discharges Invited Speaker: Radio-frequency inductive discharges are used to sustain plasma in negative ion sources for neutral beam injection [W. Kraus et al 2002 Rev. Sci. Instrum. \textbf{73}, 1096] currently under development for the ITER fusion experiment. To accompany the experimental development, a comprehensive numerical model is being developed, describing the main physical principles of these sources self-consistently: inductive coupling and electron heating in the source drivers, magnetised plasma transport in the source body, negative ion extraction across a magnetic filter, low-density neutral flow and depletion by the plasma, chemistry of negative ion creation in the volume and at the surface, etc. In this presentation we discuss the principles and modelling of the inductive electron heating in these sources. In particular, we propose a simple method to describe the anomalous skin effect through a fluid equation for electron momentum including a viscosity term with an effective viscosity coefficient. We also discuss the effects of the static and radio-frequency magnetic fields on the inductive coupling and the consequences for the plasma properties. [Preview Abstract] |
Tuesday, October 20, 2009 2:00PM - 2:30PM |
HT1.00002: Production and Control of Inductively-Coupled Plasmas with Multiple Low-Inductance Antenna Modules for Large-Area and Low-Damage Processes of Next-Generation Devices Invited Speaker: Large-area and low-damage processing of materials is of key importance for fabrication of devices including flat panel displays, thin-film photovoltaic cells and flexible electronics or electronics on polymers. In particular, organic-inorganic hybrid materials are expected as a key materials system for next-generation devices. For successful development of next-generation devices, it is of great significance to develop plasma process technologies capable of reducing plasma damage in order to achieve ultra-fine control of organic-inorganic interface without suffering degradations of organic layer. Furthermore, for enhancement of production efficiency and/or cost reduction in fabrication of these devices, it is significant to develop meters-scale/ultra-large area uniform plasma reactor. In enlargement of source size exceeding a meter, however, plasma distributions hence processing profiles become inherently non-uniform primarily due to non-uniform power deposition profile caused by standing-wave effects. In order to overcome these constraints, plasma generation and control technologies have been developed with low-inductance antenna (LIA) modules to sustain inductively-coupled RF discharge [1,2]. High-density plasma productions to attain plasma densities 10$^{11}$ - 10$^{12}$ cm$^{-3}$ have been demonstrated with simultaneous achievement of reduced sheath-edge potential (as low as or less than 5 eV) and capabilities in active control of the plasma profiles have also been exhibited by adjusting power deposition profiles over large area. Furthermore, plasma-enhanced deposition of silicon films showed low-temperature (200 deg.C) formation of micro-crystalline silicon films due to sufficiently reduced damage during deposition.\\[4pt] [1] Y. Setsuhara, T. Shoji, A. Ebe, S, Baba, N. Yamamoto, K. Takahashi, K. Ono, and S. Miyake, Surf. Coat. Technol. \textbf{174-175}, 33 (2003).\\[0pt] [2] Y. Setsuhara, K. Takenaka, A. Ebe and K. Nishisaka, Plasma Process. Polym. \textbf{4}, S628 (2007). [Preview Abstract] |
Tuesday, October 20, 2009 2:30PM - 2:45PM |
HT1.00003: Global model of instabilities in low-pressure inductively coupled chlorine plasmas Emilie Despiau-Pujo, Pascal Chabert Experimental studies have shown that low-pressure inductive discharges operating with electronegative gases are subject to instabilities near the transition between capacitive (E) and inductive (H) modes. A global model, consisting of two particle balance equations and one energy balance equation, has been previously proposed to describe the instability mechanism in SF$_{6}$/ArSF$_{6}$ [1]. This model, which agrees qualitatively well with experimental observations, leaves significant quantitative differences. In this paper, the model is revisited with Cl$_{2}$ as the feedstock gas. An alternative treatment of the inductive power deposition is evaluated and chlorine chemistry is included. Old and new models are systematically compared. The alternative inductive coupling description slightly modifies the results. The effect of gas chemistry is even more pronounced. The instability window is smaller in pressure and larger in absorbed power, the frequency is higher and the amplitudes of oscillations are reduced. The feedstock gas is weakly dissociated ($\approx $ 16{\%}) and Cl$_{2}^{+ }$is the dominant positive ion, which is consistent with the moderate electron density during the instability cycle. [1] M.A. Lieberman, A.J. Lichtenberg, and A.M. Marakhtanov, Appl. Phys. Lett. 75 (1999) 3617 [Preview Abstract] |
Tuesday, October 20, 2009 2:45PM - 3:00PM |
HT1.00004: A control-oriented self-consistent model of an inductively-coupled plasma Bernard Keville, Miles Turner An essential first step in the design of real time control algorithms for plasma processes is to determine dynamical relationships between actuator quantities such as gas flow rate set points and plasma states such electron density. An ideal first principles-based, control-oriented model should exhibit the simplicity and computational requirements of an empirical model and, in addition, despite sacrificing first principles detail, capture enough of the essential physics and chemistry of the process in order to provide reasonably accurate qualitative predictions. This presentation describes a control-oriented model of a cylindrical low pressure planar inductive discharge with a stove top antenna. The model consists of equivalent circuit coupled to a global model of the plasma chemistry to produce a self-consistent zero-dimensional model of the discharge. The non-local plasma conductivity and the fields in the plasma are determined from the wave equation and the two-term solution of the Boltzmann equation. Expressions for the antenna impedance and the parameters of the transformer equivalent circuit in terms of the isotropic electron distribution and the geometry of the chamber are presented. [Preview Abstract] |
Tuesday, October 20, 2009 3:00PM - 3:15PM |
HT1.00005: Effects of RF-bias power on plasma parameters in a low gas pressure inductively coupled plasma Hyo-Chang Lee, Min-Hyong Lee, Chin-Wook Chung Remarkable changes of the electron temperature and the plasma density by increasing bias power were observed in low gas pressure inductively coupled plasma (ICP) by the measurement of electron energy distribution function (EEDF). As the bias power increases, the electron temperature increased with accompanying the evolution of the EEDF from bi-Maxwellian to Maxwellian distribution. However, a different trend of the plasma density was observed with a dependence on the ICP powers. When the ICP power was relatively small and therefore the discharge is in E mode, the plasma density increased considerably with the bias power, while slight decrease of the plasma density was observed when the discharge is in H mode. The change of the plasma density can be explained by the balance between total power absorption and power dissipation [Preview Abstract] |
Tuesday, October 20, 2009 3:15PM - 3:30PM |
HT1.00006: Low-pressure inductive gas discharges in Ar, Kr, He and Ar+Hg mixture Natalia Denisova, Revalde Gita, Skudra Atis This paper presents results of theoretical and experimental investigations of high-frequency (HF) inductive gas discharges in Ar, Kr, He and Ar+Hg mixture in the pressure area of 0.1-10 Torr. The HF inductive discharges are known as effective sources of spectral lines. Our estimations predict that due to the skin-effect, high-frequency inductive discharge should have more high line intensity if compare with a DC discharge in the related conditions. The intensities of the Ar, Kr, He and Hg spectral lines in visible region are measured at a wide range of gas pressures varying the HF generator current. Tomographic reconstructions of spatial profiles of emitting mercury atoms in Ar+Hg discharge are performed. A stationary self-consistent model of high-frequency inductive discharge is developed including detailed kinetics of the excited atomic states. Based on the developed model, the spatial profiles of atoms in excited levels and emission properties of the discharge plasma are calculated. The detailed comparative analysis of the experimental and theoretical curves has been performed. We make the conclusion that numerical results are in good agreement with the experimental data. The obtained results - dependencies of the line intensities versus gas pressure and HF generator current - are discussed. [Preview Abstract] |
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