Bulletin of the American Physical Society

61st Annual Gaseous Electronics Conference

Volume 53, Number 10

Monday–Friday, October 13–17, 2008; Dallas, Texas

Session Index

Session XF1: Material Processing II

Chair: S.G. Walton, Naval Research Laboratory
Room: Salon E

Friday, October 17, 2008 1:30PM - 1:45PM		XF1.00001: Evaluation of Plasma Ashing Damages on Porous SiOCH Films by Measurement of H and N Radical Densities Hiroshi Yamamoto, Keigo Takeda, Makoto Sekine, Masaru Hori Preview Abstract
Friday, October 17, 2008 1:45PM - 2:00PM		XF1.00002: Threshold energy for plasma etching of high-$k$ dielectric HfO$_{2}$ films in BCl$_{3}$-containing plasmas Yoshinori Ueda, Keisuke Nakamura, Hiroaki Kiyokami, Hiroaki Ohta, Koji Eriguchi, Kouichi Ono Preview Abstract
Friday, October 17, 2008 2:00PM - 2:15PM		XF1.00003: Etch Challenges Brought by the Metal Hardmask Approach for Advanced Contact Patterning with Fluorocarbon-based Plasma Jean-Francois de Marneffe, Danny Goossens, Denis Shamiryan, Herbert Struyf, Werner Boullart Preview Abstract
Friday, October 17, 2008 2:15PM - 2:30PM		XF1.00004: Porous Low-k Material Etch For 32 nm and Beyond Yifeng Zhou, Qingjun Zhou, Ryan Patz, Hairong Tang, Jeremiah Pender, Michael Armacost, Catherine Labelle, David Horak Preview Abstract
Friday, October 17, 2008 2:30PM - 2:45PM		XF1.00005: ABSTRACT WITHDRAWN Preview Abstract
Friday, October 17, 2008 2:45PM - 3:00PM		XF1.00006: Control Capabilities of Low-Inductance-Antenna-Driven RF Plasmas for Low-Damage Processing of Polymers Yuichi Setsuhara, Kosuke Takenaka, Ken Cho, Akinori Ebe, Masaharu Shiratani, Makoto Sekine, Masaru Hori Preview Abstract
Friday, October 17, 2008 3:00PM - 3:15PM		XF1.00007: Impact of Wafer Bias in an Inductively Coupled Plasma Reactor Prashanth Kothnur, Ananth Bhoj, Xiaohui Yuan, Laxminarayan Raja Preview Abstract
Friday, October 17, 2008 3:15PM - 3:30PM		XF1.00008: The effect of plasmas on the equilibrium shapes of semi-conducting nanocrystals Eugene Tam, Kostya Ostrikov Preview Abstract

Session XF2: Capacitively-Coupled Plasmas

Chair: D. O'Connell, Queen's University Belfast
Room: Salon A-D

Friday, October 17, 2008 1:30PM - 2:00PM		XF2.00001: Nonlinear Effects on Heating in Capacitive Discharges Invited Speaker: Preview Abstract
Friday, October 17, 2008 2:00PM - 2:15PM		XF2.00002: The RF Sheath, Nonlinearity and Stochastic heating: An extended analytical approach Michael Klick Preview Abstract
Friday, October 17, 2008 2:15PM - 2:30PM		XF2.00003: Effects of Magnetic Field on Very High Frequency Capacitively Coupled Plasma Kallol Bera, Shahid Rauf, Ken Collins Preview Abstract
Friday, October 17, 2008 2:30PM - 2:45PM		XF2.00004: Resonance heating of dual frequency capacitive discharges Dennis Ziegler, Thomas Mussenbrock, Ralf Peter Brinkmann Preview Abstract
Friday, October 17, 2008 2:45PM - 3:00PM		XF2.00005: Electrode Impedance Effect on Electron Density in a CCP Reactor Yohei Yamazawa Preview Abstract
Friday, October 17, 2008 3:00PM - 3:15PM		XF2.00006: Characteristics of Pulsed Capacitively Coupled Plasma Sources for Plasma Etching Ankur Agarwal, Phillip Stout, Shahid Rauf, Ken Collins Preview Abstract
Friday, October 17, 2008 3:15PM - 3:30PM		XF2.00007: A Parallelized 3D Particle-In-Cell Method With Magnetostatic Field Solver And Its Applications Kuo-Hsien Hsu, Yen-Sen Chen, Men-Zan Bill Wu, Jong-Shinn Wu Preview Abstract

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Bulletin of the American Physical Society

61st Annual Gaseous Electronics Conference

Volume 53, Number 10

Monday–Friday, October 13–17, 2008; Dallas, Texas

Session Index

Session XF1: Material Processing II

Session XF2: Capacitively-Coupled Plasmas

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