Friday, October 17, 2008
1:30PM - 1:45PM
|
|
XF1.00001: Evaluation of Plasma Ashing Damages on Porous SiOCH Films by Measurement of H and N Radical Densities
Hiroshi Yamamoto, Keigo Takeda, Makoto Sekine, Masaru Hori
Preview Abstract |
Friday, October 17, 2008
1:45PM - 2:00PM
|
|
XF1.00002: Threshold energy for plasma etching of high-$k$ dielectric HfO$_{2}$ films in BCl$_{3}$-containing plasmas
Yoshinori Ueda, Keisuke Nakamura, Hiroaki Kiyokami, Hiroaki Ohta, Koji Eriguchi, Kouichi Ono
Preview Abstract |
Friday, October 17, 2008
2:00PM - 2:15PM
|
|
XF1.00003: Etch Challenges Brought by the Metal Hardmask Approach for Advanced Contact Patterning with Fluorocarbon-based Plasma
Jean-Francois de Marneffe, Danny Goossens, Denis Shamiryan, Herbert Struyf, Werner Boullart
Preview Abstract |
Friday, October 17, 2008
2:15PM - 2:30PM
|
|
XF1.00004: Porous Low-k Material Etch For 32 nm and Beyond
Yifeng Zhou, Qingjun Zhou, Ryan Patz, Hairong Tang, Jeremiah Pender, Michael Armacost, Catherine Labelle, David Horak
Preview Abstract |
Friday, October 17, 2008
2:30PM - 2:45PM
|
|
XF1.00005: ABSTRACT WITHDRAWN
Preview Abstract |
Friday, October 17, 2008
2:45PM - 3:00PM
|
|
XF1.00006: Control Capabilities of Low-Inductance-Antenna-Driven RF Plasmas for Low-Damage Processing of Polymers
Yuichi Setsuhara, Kosuke Takenaka, Ken Cho, Akinori Ebe, Masaharu Shiratani, Makoto Sekine, Masaru Hori
Preview Abstract |
Friday, October 17, 2008
3:00PM - 3:15PM
|
|
XF1.00007: Impact of Wafer Bias in an Inductively Coupled Plasma Reactor
Prashanth Kothnur, Ananth Bhoj, Xiaohui Yuan, Laxminarayan Raja
Preview Abstract |
Friday, October 17, 2008
3:15PM - 3:30PM
|
|
XF1.00008: The effect of plasmas on the equilibrium shapes of semi-conducting nanocrystals
Eugene Tam, Kostya Ostrikov
Preview Abstract |
