61st Annual Gaseous Electronics Conference
Volume 53, Number 10
Monday–Friday, October 13–17, 2008;
Dallas, Texas
Session Index
Session DT1: Plasma-Surface Interactions
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Chair: CW Chung, Hanyang University, Korea
Room: Salon E
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Tuesday, October 14, 2008
1:30PM - 2:00PM
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DT1.00001: Study of elementary processes of plasma-wall interaction in fusion devices by means of an inductively coupled hydrogen plasma in interaction with graphite surfaces
Invited Speaker:
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Tuesday, October 14, 2008
2:00PM - 2:15PM
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DT1.00002: Manipulation of the bombarding ion energy distribution in fluorocarbon plasma etching
Amy Wendt, Frank Buzzi, Yuk-Hong Ting
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Tuesday, October 14, 2008
2:15PM - 2:30PM
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DT1.00003: Atomic-scale cellular model and profile simulation of Si etching in chlorine- and bromine-containing plasmas: Effects of surface oxidation on evolution of feature profiles
Hirotaka Tsuda, Shoki Irie, Masahito Mori, Hiroaki Ohta, Koji Eriguchi, Kouichi Ono
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Tuesday, October 14, 2008
2:30PM - 2:45PM
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DT1.00004: Mechanistic model of atomic recombination
J.D. Guha, V.M. Donnelly
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Tuesday, October 14, 2008
2:45PM - 3:00PM
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DT1.00005: Surface loss rate of H and N radicals in H$_{2}$/N$_{2}$ plasma etching process
Chang Sung Moon, Keigo Takeda, Toshio Hayashi, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori
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Tuesday, October 14, 2008
3:00PM - 3:15PM
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DT1.00006: ABSTRACT WITHDRAWN
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Tuesday, October 14, 2008
3:15PM - 3:30PM
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DT1.00007: Effects of Remote Plasma Treatment on Surface Defects in ZnO Nanopowders
Jorge Paramo, Raul Peters, Yuri Strzhemechny
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