Bulletin of the American Physical Society
60th Gaseous Electronics Conference
Volume 52, Number 9
Tuesday–Friday, October 2–5, 2007; Arlington, Virginia
Session VF1: Materials Processing in Low Pressure Plasmas II: Etching, deposition, new materials
8:00 AM–10:00 AM,
Friday, October 5, 2007
Doubletree Crystal City
Room: Crystal Ballroom A
Chair: Evgeniya Lock, Naval Research Laboratory
Abstract ID: BAPS.2007.GEC.VF1.6
Abstract: VF1.00006 : Multi-hollow discharge plasma CVD reactor with magnets for highly stable a-Si:H film deposition
9:30 AM–9:45 AM
Preview Abstract Abstract
Authors:
Kazunori Koga
(Kyushu University)
William M. Nakamura
(Kyushu University)
Hiroshi Satou
(Kyushu University)
Hiroomi Miyahara
(Kyushu University)
Masaharu Shiratani
(Kyushu University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2007.GEC.VF1.6
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