The Synthesis, Heating, and Analysis of Boron-Containing Thin Films*

This research focuses on the creation and characterization of CrB₂, TiB₂, WB, W₂B, W₂B₅, ZrB2 thin films. The thin films topographical properties were measured using atomic force microscopy (AFM). The films were sputtered in two thicknesses, 100 nm and 200 nm, using DC magnetron sputtering (DCMS). The surface chemistry was determined using X-ray photoelectron spectroscopy (XPS). The thin films were annealed to temperatures to 150 °C and 250 °C and their electrical transport properties were determined using the hall effect measurement system.