2006 48th Annual Meeting of the Division of Plasma Physics
Monday–Friday, October 30–November 3 2006;
Philadelphia, Pennsylvania
Session UI2: Advances in Laser and Plasma Based Accelerators
9:30 AM–12:30 PM,
Thursday, November 2, 2006
Philadelphia Marriott Downtown
Room: Grand Salon CDE
Chair: Warren Mori, University of California, Los Angeles
Abstract ID: BAPS.2006.DPP.UI2.6
Abstract: UI2.00006 : Application of the Finite-Element MICHELLE to RF Photoemission Modeling*
12:00 PM–12:30 PM
Preview Abstract
Abstract
Author:
John Petillo
(Science Applications International Corp.)
RF photocathodes are difficult to model but continue to be at the
forefront
of solutions to many applications, especially as high power FEL
sources.
Modeling the photoemission process requires a high degree of
computational
mesh resolution to resolve geometrical and surface finish
features, or
simply fine spatial scale phenomena. The new Finite-Element (FE)
MICHELLE
[1] two-dimensional (2D) and three-dimensional (3D) steady-state and
time-domain particle-in-cell (PIC) code has been employed
successfully by
industry, national laboratories, and academia and has been used
to design
and analyze a wide variety of beam sources and devices. In
particular, the
MICHELLE code has the ability to resolve small spatial scales,
and is a good
choice for photoemission modeling. To investigate the application
of the
Electrostatic time-domain model to emission properties of
photocathodes, two
code models are needed; an EM frequency-domain code and a PIC
code. We use
the STAR ANALYST [2] code for the Frequency Domain solutions and the
NRL/SAIC MICHELLE code for the PIC solutions. The RF fields from
ANALYST are
imported into the MICHELLE code and clocked in time. MICHELLE
adds the self
fields and emits the beam according to an emission rule. For the
photoemission process, we employ the NRL photoemission model [3],
and can
capture detailed spatial and temporal effects of the emission
surface finish
and beam development. In the talk, we will consider an example that
investigates the effects of fine scale surface imperfections on the
photoemission process.
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[1] John Petillo, et al., ``The MICHELLE
Three-Dimensional Electron and Collector Modeling Tool: Theory
and Design,'' IEEE Trans. Plasma Sci., vol. 30, no. 3, June 2002,
pp. 1238-1264.
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[2] Analyst is a commercial finite-element package for
electromagnetic
design. www.staarinc.com.
\newline
[3]K. Jensen, et al., ``The Quantum Efficiency of Dispenser
Photocathode:
Comparison of Theory to Experiment'' Applied Physics Lett. 85,
22, 5448,
2004.
*Work supported by the Office of Naval Research.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2006.DPP.UI2.6