Mitigation of Interface Losses in Transmon Qubits Using Hydrofluoric Etches*

Superconducting transmon qubits, a promising hardware platform for quantum computing applications, have developed from proof-of principle single-bit demonstrations to mature deployments of many-qubit quantum processors. Reducing losses in superconducting qubit circuits is critical to further the development of large-scale transmon architectures. In this talk we discuss the potential of hydrofluoric etches to remove lossy silicon oxides in close proximity to sensitive circuit elements such as Josephson Junctions, resonators and crossover tethers. This etch can be implemented at several different process points during the fabrication of these elements with little to no damage to existing structures. The results and future potential of these etches will be discussed.