Bulletin of the American Physical Society
2023 APS March Meeting
Volume 68, Number 3
Las Vegas, Nevada (March 5-10)
Virtual (March 20-22); Time Zone: Pacific Time
Session A56: Spin transport and spin-orbitronics
8:00 AM–11:00 AM,
Monday, March 6, 2023
Room: Room 304
Sponsoring
Unit:
GMAG
Chair: Joe Paddison, Oak Ridge National Lab
Abstract: A56.00007 : Spin-orbit torque switching from spin-momentum locked surface states of amorphous BiSe*
9:36 AM–9:48 AM
Presenter:
Felix J Kohr
(University of California, Berkeley)
Authors:
Felix J Kohr
(University of California, Berkeley)
Paul Corbae
(University of California, Berkeley)
Debanjan Polley
(Lawrence Berkeley National Laboratory)
Frances Hellman
(University of California, Berkeley)
Due to the spin-momentum locked surface states, an electrical current flowing posseses a net spin-polarization, which we use to switch an adjacent ferromagnetic layer using spin-orbit torque. We grow heterostructures of amorphous Bi2Se3 on top of a sputtered Ta/Co/Pt magnetic layer stack, which has perpendicular magnetic anisotropy. We investigate the spin-orbit torque efficiency of the Bi2Se3 by using standard harmonic hall and hysteresis loop shift measurements with devices in Hall-cross geometry. Finally, we are exploring the ultrafast magnetization dynamics by patterning the material stack and depositing an Auston switch on a LT-GaAs substrate, that allows the generation of ps-current pulses, while the magnetic response is observed using time resolved MOKE measurements.
For amorphous Bi2Se3-thicknesses <10nm we find a spin Hall angle that is larger compared to those of conventional heavy metals. The spin-orbit torque efficiency is furthermore decreasing for increasing Bi2Se3-thickness, indicating a dominant contribution of the spin-momentum locked surface states.
Our results have important consequences to technological applications since the growth conditions of amorphous Bi2Se3 are much less stringent than its crystalline counterpart.
*Work primarily funded by the U.S. DOE, MSD, Contract No. DE-AC02-05-CH11231 (NEMM program)
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