Bulletin of the American Physical Society
APS March Meeting 2020
Volume 65, Number 1
Monday–Friday, March 2–6, 2020; Denver, Colorado
Session S52: Complex Oxide Films, Surfaces, and Interfaces II
11:15 AM–2:15 PM,
Thursday, March 5, 2020
Room: Mile High Ballroom 1E
Sponsoring
Unit:
DCMP
Chair: Daniel Dougherty, North Carolina State University
Abstract: S52.00011 : Engineering Coercivity of SrRuO3 thin film by SrTiO3 capping layer
Presenter:
Eun Kyo Ko
(Center for Correlated Electron Systems (CCES), Institute for Basic Science (IBS))
Authors:
Eun Kyo Ko
(Center for Correlated Electron Systems (CCES), Institute for Basic Science (IBS))
Junsik Mun
(Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University)
Han-Gyeol Lee
(Center for Correlated Electron Systems (CCES), Institute for Basic Science (IBS))
Jinkwon Kim
(Center for Correlated Electron Systems (CCES), Institute for Basic Science (IBS))
Miyoung Kim
(Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University)
Lingfei Wang
(Center for Correlated Electron Systems (CCES), Institute for Basic Science (IBS))
Tae Won Noh
(Center for Correlated Electron Systems (CCES), Institute for Basic Science (IBS))
Here, we reported our recent result on controlling HC of SRO ultrathin film by a SrTiO3 (STO) capping layer. The film was deposited by pulsed laser deposition. By controlling the thickness and growth oxygen partial pressure of STO capping layer, we can tune the HC of SRO films by an amplitude over 100%. Such an effective modulation of HC is highly related to the oxygen vacancies transferred from STO capping layer to SRO film.
[1] J. Matsuno et al., Sci. Adv. (2016)
[2] L. Wang et al., Nat. Mat. (2018)
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