Bulletin of the American Physical Society
APS March Meeting 2020
Volume 65, Number 1
Monday–Friday, March 2–6, 2020; Denver, Colorado
Session L52: Semiconductor Films and Interfaces
8:00 AM–10:36 AM,
Wednesday, March 4, 2020
Room: Mile High Ballroom 1E
Sponsoring
Unit:
DCMP
Chair: Daniel Dougherty, North Carolina State University
Abstract: L52.00012 : Temperature dependent X-ray studies of negative thermal expansion (NTE) ScF3 thin films under strain
Presenter:
Amani Jayakody
(Univ of Connecticut - Storrs)
Authors:
Amani Jayakody
(Univ of Connecticut - Storrs)
Zhiwei Zhang
(Univ of Connecticut - Storrs)
Zhihai Zhu
(Massachusetts Institute of Technology)
Hope R Whitelock
(University of Colorado)
Joseph I Budnick
(Univ of Connecticut - Storrs)
Jason N Hancock
(Univ of Connecticut - Storrs)
Barrett O Wells
(Univ of Connecticut - Storrs)
Bulk Scandium trifluoride (ScF3) is known for a pronounced negative thermal expansion (NTE) over a wide range of temperature, from 10 K to 1100 K. The structure of ScF3 can be described as an ABX3 perovskite with an empty A-site. Growing films of ScF3 allows for tuning the lattice constant, the thermal expansion, and the construction of devices based upon differential thermal expansion. We have investigated the growth of ScF3 films on oxide and fluoride substrates using pulsed laser deposition (PLD). We have found growth routes for producing films with very good epitaxy and stability. Curiously, diffraction studies show narrow Bragg peaks along the principal crystallographic directions but substantial broadening for peaks along other directions, presumably associated with accommodating drastic differentials in thermal expansion. This report describes the temperature dependent X-ray studies of epitaxial NTE ScF3 thin films grown epitaxially on a strongly positive thermal expansion (PTE) substrate.
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