Bulletin of the American Physical Society
APS March Meeting 2020
Volume 65, Number 1
Monday–Friday, March 2–6, 2020; Denver, Colorado
Session A49: Superconducting Proximity Effect and Josephson Junctions
8:00 AM–11:00 AM,
Monday, March 2, 2020
Room: Mile High Ballroom 1B
Sponsoring
Unit:
DCMP
Chair: Dmitry Smirnov, National High Magnetic Field Laboratory
Abstract: A49.00006 : Superconducting Proximity Effect in Magnetically-Doped Topological Insulators using Bulk Single Crystals*
View Presentation Abstract
Presenter:
Rikizo Yano
(Applied Physics, Nagoya University)
Authors:
Rikizo Yano
(Applied Physics, Nagoya University)
Kohei Tsumura
(Applied Physics, Nagoya University)
Hishiro T. Hirose
(Laboratory for Materials and Structures, Tokyo Institute of Technology)
Masahiro Yamamoto
(Applied Physics, Nagoya University)
Andrei Kudriashov
(TQPSS, Moscow Institute of Physics and Technology)
Masao Koyanagi
(National Institute of Advanced Industrial Science and Technology)
Hiromi Kashiwaya
(National Institute of Advanced Industrial Science and Technology)
Yasuhiro Asano
(Center of Topological Science and Technology, Hokkaido University)
Vasily Stolyarov
(TQPSS, Moscow Institute of Physics and Technology)
Takao Sasagawa
(Laboratory for Materials and Structures, Tokyo Institute of Technology)
Satoshi Kashiwaya
(Applied Physics, Nagoya University)
In this study, we prepared another magnetic TI with a high bulk resistivity and fabricated its Josephson junctions without edge contacts. As a result, a similar three-peak structure was also observed, suggesting that the observed unique behaviors found in the former junction also came from the surface contribution. Furthermore, we observed a unique magnetic response possibly related to bulk magnetic properties. We believe that those results promote our understanding of the proximity effect on topological materials.
*This study was supported by JST CREST (Grant No. JPMJCR16F2) and KAKENHI (Grant Nos. JP15H05851, 15H05853, 16H03847, and 18H01243). Crystal growth was supported by the CRP of MSL-Tokyo Tech. The fabrication process was performed at the AIST-NPF, supported by NTPJ of the MEXT, Japan.
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