Bulletin of the American Physical Society
APS March Meeting 2019
Volume 64, Number 2
Monday–Friday, March 4–8, 2019; Boston, Massachusetts
Session S45: Oxides Films, Coatings, and Related Applications
11:15 AM–2:03 PM,
Thursday, March 7, 2019
BCEC
Room: 211
Sponsoring
Unit:
DCMP
Chair: Robert Klie, Univ of Illinois - Chicago
Abstract: S45.00014 : TiO2 doped Ta2O5 coatings grown by biased target ion beam deposition for gravitational wave detectors*
1:51 PM–2:03 PM
Presenter:
Mariana Fazio
(Department of Electrical and Computer Engineering and NSF ERC for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO, USA)
Authors:
Mariana Fazio
(Department of Electrical and Computer Engineering and NSF ERC for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO, USA)
Gabriele Vajente
(LIGO Laboratory, California Institute of Technology, Pasadena, CA, USA)
Alena Ananyeva
(LIGO Laboratory, California Institute of Technology, Pasadena, CA, USA)
Eric Keith Gustafson
(LIGO Laboratory, California Institute of Technology, Pasadena, CA, USA)
Carl Lévesque
(Université de Montréal, Montréal, Quebec, Canada)
François Schiettekatte
(Université de Montréal, Montréal, Quebec, Canada)
Ashot Markosyan
(Department of Applied Physics, Ginzton Laboratory, Stanford University, Stanford, CA, USA)
Riccardo Bassiri
(Department of Applied Physics, Ginzton Laboratory, Stanford University, Stanford, CA, USA)
Martin Fejer
(Department of Applied Physics, Ginzton Laboratory, Stanford University, Stanford, CA, USA)
Carmen Susana Menoni
(Department of Electrical and Computer Engineering and NSF ERC for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO, USA)
Collaboration:
Mariana Fazio
The deposition system consists of a low energy ion source and metallic targets individually pulsed biased. Control of each target bias allows for mixing Ta2O5 and TiO2, with estimates of the doping obtained by x-ray photoelectron spectroscopy. Extensive characterization shows the films are nearly stoichiometric and dense, with an absorption loss at 1064 nm lower than 20 ppm. Mechanical loss was measured in as deposited coatings and after annealing. For all TiO2 concentrations the mechanical loss is reduced after annealing, reaching a minimum for around 20% TiO2 after annealing at 600 C comparable to state-of-the-art TiO2 doped Ta2O5.
*Work supported by the Center for Coatings Research NSF award No.:1710957.
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