Monday, February 27, 2012
11:15AM - 11:27AM
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B45.00001: ABSTRACT WITHDRAWN
Preview Abstract |
Monday, February 27, 2012
11:27AM - 11:39AM
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B45.00002: Effect of Solvent Removal Rate on the Morphology of Solvent Vapor Annealed ABA Triblock Copolymer Thin Films
Julie N. L. Albert
, Wen-Shiue Young
, Ronald L. Lewis, III
, Timothy D. Bogart
, Jasmine R. Smith
, Thomas H. Epps, III
Preview Abstract |
Monday, February 27, 2012
11:39AM - 11:51AM
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B45.00003: Obtaining Perpendicular Block Copolymer Morphologies with Solvent Annealing
Kevin Gotrik
, Jeong Gon Son
, Adam Hannon
, Caroline Ross
Preview Abstract |
Monday, February 27, 2012
11:51AM - 12:03PM
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B45.00004: Mesoscale Dynamics of Solvent Evaporation in Block Copolymer Thin Films
Sean Paradiso
, Su-mi Hur
, Kris Delaney
, Hector Ceniceros
, Carlos Garcia-Cervera
, Glenn Fredrickson
Preview Abstract |
Monday, February 27, 2012
12:03PM - 12:15PM
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B45.00005: Optimizing the Combination of Solvent Annealing and Directed Self-Assembly in Thin Film Block Copolymer Systems Using Self-Consistent Field Theory
Adam Hannon
, Kevin Gotrik
, Alfredo Alexander-Katz
, Caroline Ross
Preview Abstract |
Monday, February 27, 2012
12:15PM - 12:27PM
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B45.00006: Sub-10 nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing
Jeong Gon Son
, Jae-Byum Chang
, Karl K. Berggren
, Caroline A. Ross
Preview Abstract |
Monday, February 27, 2012
12:27PM - 12:39PM
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B45.00007: Raster solvent vapor annealing of block copolymer thin films
Jonathan Seppala
, Ronald Lewis
, Thomas Epps
Preview Abstract |
Monday, February 27, 2012
12:39PM - 12:51PM
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B45.00008: Confined drying of copolymer solutions
Daubersies Laure
, Leng Jacques
, Salmon Jean-Baptiste
Preview Abstract |
Monday, February 27, 2012
12:51PM - 1:03PM
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B45.00009: Rapid Self- Assembly and Perpendicular Alignment in lamellar PS-b-PEO System for Fabrication of Sub 20 nm Nanolithography Templates
Parvaneh Mokarian-Tabari
, Timothy W. Collins
, Ramsankar Senthamaraikannan
, Justin D. Holmes
, Michael A. Morris
Preview Abstract |
Monday, February 27, 2012
1:03PM - 1:15PM
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B45.00010: Controlled Deposition of Ordered Block Copolymer Thin Films by Electrospray
Hanqiong Hu
, Sofia Rangou
, Apostolos Avergopoulos
, Chinedum Osuji
Preview Abstract |
Monday, February 27, 2012
1:15PM - 1:27PM
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B45.00011: Two distinct timescales in the ordering of symmetric diblock copolymer films
Robert D. Peters
, Kari Dalnoki-Veress
Preview Abstract |
Monday, February 27, 2012
1:27PM - 1:39PM
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B45.00012: The hydration and ordering of lamellar block copolymer films prior to the formation of polymer vesicles
Yohei Kamata
, Andrew Parnell
, Andrew Dennison
, Robert Barker
, Philipp Gutfreund
, Maximilian Skoda
, Shaomin Mai
, Richard Jones
Preview Abstract |
Monday, February 27, 2012
1:39PM - 1:51PM
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B45.00013: Effect of thickness on microdomain orientation in shear-aligned, cylinder-forming PS-PHMA thin films
Raleigh Davis
, Paul Chaikin
, Richard Register
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Monday, February 27, 2012
1:51PM - 2:03PM
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B45.00014: GISAXS simulation and analysis on GPU clusters
Slim Chourou
, Abhinav Sarje
, Xiaoye Li
, Elaine Chan
, Alexander Hexemer
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Monday, February 27, 2012
2:03PM - 2:15PM
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B45.00015: Modeling Line Edge Roughness in Lamellar Block Copolymer Systems
Paul Patrone
, Gregg Gallatin
Preview Abstract |
