Session A45: Focus Session: Thin Film Block Copolymers - Directed Assembly
8:00 AM–11:00 AM, Monday, February 27, 2012
Room: 159
Sponsoring Unit:
DPOLY
Chair: Thomas Epps, University of Delaware
Abstract ID: BAPS.2012.MAR.A45.11
Abstract: A45.00011 : Block copolymer thin films with long-range lateral order
10:24 AM–10:36 AM
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Abstract 
Authors:
Ilja Gunkel
(Lawrence Berkeley National Laboratory)
Ting Xu
(University of California, Berkeley)
Alexander Hexemer
(Lawrence Berkeley National Laboratory)
Thomas Russell
(University of Massachusetts, Amherst)
We investigated thin block copolymer films on silicon wafers as well as faceted surfaces of sapphire. Thin films were prepared by spin-coating block copolymer solutions on the corresponding substrates. Subsequent annealing in organic solvent vapors served as a means to induce lateral long-range order in the thin films. The resulting block copolymer structures were analyzed by AFM and GISAXS.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2012.MAR.A45.11