Bulletin of the American Physical Society
APS March Meeting 2011
Volume 56, Number 1
Monday–Friday, March 21–25, 2011; Dallas, Texas
Abstract: K1.00031 : Thermal analysis study of polysterene-poly(methyl methacrylate) (PS-PMMA) diblock copolymer thin films morphologies when annealed and sheared under vacuum in inert atmosphere
Author:
Diblock copolymers are made of two chemically bonded blocks, with
incompatible monomers. This incompatibility gives the block the
property to
phase separate at temperatures above the glass transition
(Tg). The ability to self-assemble into different mesophase
structures is of
great importance in nanolithography and nanofabrication. This
research
involves the morphological study of PS-PMMA thin films annealed
under inert
atmosphere. Our objective is to determine the microstructure
properties of
the PS-PMMA diblock copolymer as a function of film thickness,
annealing
temperature, and applied shear force. The PS-PMMA thin film is
spin casted
onto silicon substrates, and annealed under an inert atmosphere.
Our initial
results show that the samples have an incomplete formation of the
microstructures. However, further film analysis is needed to
study the
morphological properties when annealed. Futures studies will
focus on the
effects of a shear force during annealing, to align the film
microstructures.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.K1.31
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2021 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
1 Research Road, Ridge, NY 11961-2701
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700