Bulletin of the American Physical Society
APS March Meeting 2011
Volume 56, Number 1
Monday–Friday, March 21–25, 2011; Dallas, Texas
Abstract: C1.00031 : Modification of Silicon Oxide Surfaces with Thermally Annealed Polystyrene Films
Author:
The modification of silicon with a native oxide surface has
been accomplished by annealing thin films of anionically
polymerized polystyrene spun-coat from solution at elevated
temperature followed by dissolving the film in solvent to leave
a thin layer of adsorbed polymer that persisted even after
prolonged desorbing in solvent even at elevated temperature. It
was found by water contact angle analysis of the samples after
washing with organic solvent that annealing is a key step to
adsorption of a thin layer of polystyrene on the film surface.
X-ray reflectivity analysis also demonstrated that the
thickness of the adsorbed layer is proportional to the
molecular weight of the polymer. However, the contact angle
showed a non-monotonic dependence on molecular weight. The
further modification of these surfaces by ultraviolet/ozone
treatment will be discussed. This is a novel surface treatment
method as it performed with a polystyrene polymer without any
additional chemical functionality through straight-forward
vacuum annealing and washing with organic solvent.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.C1.31
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