Bulletin of the American Physical Society
APS March Meeting 2011
Volume 56, Number 1
Monday–Friday, March 21–25, 2011; Dallas, Texas
Abstract: C1.00028 : Reaction-Diffusion Processes in Ultrathin Films of Photoresist
Author:
Projection lithography is the primary technology used for
patterning semiconductor devices. High-throughput manufacturing
requires imaging materials (resists) that are highly sensitive to
radiation, and this demand is satisfied through a process termed
chemical amplification (CA). CA resists are comprised of a
polymer resin (reactant) and photoacid generator (catalyst); a
coupled reaction-diffusion mechanism drives image formation,
where image resolution is limited by slow diffusion of the acid
catalyst. There is evidence that thin film reaction rates deviate
from the bulk behavior, and current models for image formation do
not capture such effects. We demonstrate that X-Ray Diffraction
can measure spatial extent-of-reaction in ultrathin films of a
nanopatterned poly(4-hydroxystyrene-co-tertbutylacrylate) CA
resist. The feedback acquired is used to construct predictive
models for the coupled reaction-diffusion processes that
incorporate the physics of confined polymers.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.C1.28
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2021 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
1 Research Road, Ridge, NY 11961-2701
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700