Bulletin of the American Physical Society
APS March Meeting 2011
Volume 56, Number 1
Monday–Friday, March 21–25, 2011; Dallas, Texas
Abstract: C1.00148 : Investigation of Chemical Reactivity at the Co/CuO interface by X-ray Photoelectron Spectroscopy
Author:
The technique of x-ray photoelectron spectroscopy has been utilized to
investigate the chemical reactivity between cobalt and copper oxide at the
Co/CuO interface. Thin films of copper (about 15 nm) were deposited on
silicon substrates by the e-beam method. Such samples were oxidized in an
oxygen environment in a quartz tube furnace at 400\r{ }C. The formation of
CuO was checked by the XPS spectral data. Thin films of cobalt were then
deposited on these CuO samples. The cobalt 2p, oxygen 1s and copper 2p
regions were investigated by XPS. The magnesium anode (energy = 1253.6 eV)
has been used for this purpose. The spectral data show chemical reactivity
at the Co/CuO interface. The samples were annealed afterwards in air at
400\r{ }C. The spectral data were recorded at different take-off angles.
Diffusion of copper through the cobalt overlayer with the formation of CuO
is observed in the annealed samples.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.C1.148
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