Session Z44: Focus Session: Organic Electronics and Photonics -- New Materials and Applications
11:15 AM–1:51 PM, Friday, March 25, 2011
Room: A309
Sponsoring Units:
DMP DPOLY
Chair: Rui He, Columbia University
Abstract ID: BAPS.2011.MAR.Z44.13
Abstract: Z44.00013 : Photo-active Silicon Containing Polymer Films; An Approach Towards All-Solution Processable Devices
1:39 PM–1:51 PM
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Abstract
Authors:
Scott LeFevre
(Rensselaer Polytechnic Institute)
Xinxing Liu
(Rensselaer Polytechnic Institute)
Leonard Interrante
(Rensselaer Polytechnic Institute)
Chang Ryu
(Rensselaer Polytechnic Institute)
The continuous drive for smaller, cheaper electronic devices elucidates the necessity for the design and incorporation of materials with improved properties along with a greater ease of processability. Polycarbosilanes (PCSs) are a class of organic-inorganic hybrid materials which exhibit increased chemical and thermal stability, appreciable hydrophobicity, and significant mechanical robustness. Recently, we have developed UV-crosslinkable cyclolinear PCSs by the incorporation of aryl substituted disilacyclobutane (DSCB) rings into the backbone. This novel material exhibits a low dielectric constant (k), making it an attractive new material in the development of interlayer dielectrics. Preliminary data shows that there is a maximum UV-crosslinking depth of approximately 30 microns. Additionally we have successfully demonstrated the resist capabilities of this material by patterning micro-scale (about 10 microns) features with a surface roughness variation of approx. 1 percent. Finally, new approaches towards taking advantage of the reactivity of polysilanes and the effect of molecular weight and polydispersity will be discussed.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.MAR.Z44.13