Bulletin of the American Physical Society
69th Annual Gaseous Electronics Conference
Volume 61, Number 9
Monday–Friday, October 10–14, 2016; Bochum, Germany
Session AM3: Pulsed High Power Plasmas for Synthesis of Nanostructured Thin FilmsFocus
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Chair: Peter Awakowicz, Ruhr University Room: Room 3 |
Monday, October 10, 2016 11:00AM - 11:30AM |
AM3.00001: High Power Impulse Magnetron Sputtering - the Age of Adolescence Invited Speaker: Arutiun Ehiasarian |
Monday, October 10, 2016 11:30AM - 12:00PM |
AM3.00002: Lessons from modelling DC reactive magnetron sputtering for HIPIMS users Invited Speaker: Diederik Depla |
Monday, October 10, 2016 12:00PM - 1:30PM |
AM3.00003: Lunch Break
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Monday, October 10, 2016 1:30PM - 2:00PM |
AM3.00004: Synchronized metal-ion irradiation as a way to control growth of transition-metal nitride alloy films during hybrid HIPIMS/DCMS co-sputtering Invited Speaker: Grzegorz Greczynski High-power pulsed magnetron sputtering (HIPIMS) is particularly attractive for growth of transition metal (TM) nitride alloys for two reasons: (i) the high ionization degree of the sputtered metal flux, and (ii) the time separation of metal- and gas-ion fluxes incident at the substrate.$^{\mathrm{\thinspace }}$The former implies that ion fluxes originating from elemental targets operated in HIPIMS are distinctly different from those that are obtained during dc magnetron sputtering (DCMS), which helps to separate the effects of HIPIMS and DCMS metal-ion fluxes on film properties. The latter feature allows one to minimize compressive stress due to gas-ion irradiation, by synchronizing the pulsed substrate bias with the metal-rich-plasma portion of the HIPIMS pulse. Here, we use pseudobinary TM nitride model systems TiAlN, TiSiN, TiTaN, and TiAlTaN to carry out experiments in a hybrid configuration with one target powered by HIPIMS, the other operated in DCMS mode.$^{\mathrm{\thinspace }}$This allows us to probe the roles of intense and metal-ion fluxes ($n \quad =$ 1, 2) from HIPIMS-powered targets on film growth kinetics, microstructure, and physical properties over a wide range of M$_{\mathrm{1}}$M$_{\mathrm{2}}$N alloy compositions. TiAlN and TiSiN mechanical properties are shown to be determined by the average metal-ion momentum transfer per deposited atom. Irradiation with lighter metal-ions (M$_{\mathrm{1}} \quad =$ Al$^{\mathrm{+}}$ or Si$^{\mathrm{+}}$ during M$_{\mathrm{1}}$-HIPIMS/Ti-DCMS) yields fully-dense single-phase cubic Ti$_{\mathrm{1-}}_{x}$(M$_{\mathrm{1}})_{x}$N films. In contrast, with higher-mass film constituent ions such as Ti$^{\mathrm{+}}$, easily exceeds the threshold for precipitation of second phase $w$-AlN or Si$_{\mathrm{3}}$N$_{\mathrm{4}}$. Based on the above results, a new PVD approach is proposed which relies on the hybrid concept to grow dense, hard, and stress-free thin films with no external heating. The primary targets, Ti and/or Al, operate in DCMS mode providing a continuous flux of sputter-ejected metal atoms to sustain a high deposition rate, while a high-mass target metal, Ta, is driven by HIPIMS to serve as a pulsed source of energetic heavy-metal ions to densify the dilute TiTaN and/or TiAlTaN alloys. No external heating is used and the substrate temperature does not exceed 120 \textdegree C. This development allows for widening the application range of hard TM nitride coatings to new classes of technologically-relevant temperature-sensitive substrates, such as components made by plastics, glasses, aluminum alloys, and tempered steels. [Preview Abstract] |
Monday, October 10, 2016 2:00PM - 2:30PM |
AM3.00005: Control of nanoscale atomic arrangement in multicomponent thin films by temporally modulated vapour fluxes Invited Speaker: Kostas Sarakinos Synthesis of multicomponent thin films using vapor fluxes with a modulated deposition pattern is a potential route for accessing a wide gamut of atomic arrangements and morphologies for property tuning. In the current study, we present a research concept that allows for understanding the combined effect of flux modulation, kinetics and thermodynamics on the growth of multinary thin films. This concept entails the combined use of thin film synthesis by means of multiatomic vapor fluxes modulated with sub-monolayer resolution [1], deterministic growth simulations and nanoscale microstructure probes. Using this research concept we study structure formation within the archetype immiscible Ag-Cu binary system showing that atomic arrangement and morphology at different length scales is governed by diffusion of near-surface Ag atoms to encapsulate 3D Cu islands growing on 2D Ag layers [2]. Moreover, we explore the relevance of the mechanism outlined above for morphology evolution and structure formation within the miscible Ag-Au binary system. The knowledge generated and the methodology presented herein provides the scientific foundation for tailoring atomic arrangement and physical properties in a wide range of miscible and immiscible multinary systems. [1] ``\textit{A METHOD OF CONTROLLING IN-PLANE COMPOSITIONAL MODULATION}'', Patent Pending Application, PCT/EP2014/052831. [2] V. Elofsson, G.A. Almyras, B. L\"{u}, R.D. Boyd, and K. Sarakinos, ``\textit{Atomic arrangement in immiscible Ag-Cu alloys synthesized far-from-equilibrium}'', Acta Mater. 110, 114 (2016). [Preview Abstract] |
Monday, October 10, 2016 2:30PM - 2:45PM |
AM3.00006: Coffee Break
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Monday, October 10, 2016 2:45PM - 3:15PM |
AM3.00007: What can we learn about HiPIMS process from the multidimensional plasma modeling? Invited Speaker: Tiberiu Minea The modeling of PVD process and especially magnetron plasma is widely reported. The novel way to excite the plasma applying to the cathode very high power pulses brings the temporal dimension to the system together with new phenomena. From the kinetic model of the dense plasma region, so called Ionization Region -- IR, one can quantify the global behavior of the plasma parameters during the pulse. The most significant are the plasma composition, especially in the case of reactive gases, the fraction of back-attracted sputtered ions, the rarefaction due to wind effect, but also the discharge heating mechanisms and contribution to the discharge current. From the 2D particle modeling of the plasma new insights are revealed concerning the shape of the dense plasma region, the time evolution of the sheath, the electron energy distribution function, but also the characteristics of the diffusion plasma facing the substrate. Adding the third dimension to the model, the results reveal the complex transport of electrons especially in the azimuthal direction (instabilities and drifts), the formation of spokes and flares, and the strong relation between the secondary emission of electrons from the target and the plasma structuring. [Preview Abstract] |
Monday, October 10, 2016 3:15PM - 3:45PM |
AM3.00008: Localized traveling ionization zones and their importance for the high power impulse magnetron sputtering process Invited Speaker: Christian Maszl High power impulse magnetron sputtering (HiPIMS) is a technique to deposit thin films with superior quality. A high ionization degree up to $90\%$ and the natural occurence of high energetic metal ions are the reason why HiPIMS exceeds direct current magnetron sputtering in terms of coating quality. On the other hand HiPIMS suffers from a reduced efficiency, especially if metal films are produced. Therefore, a lot of research is done by experimentalists and theoreticians to clarify the transport mechanisms from target to substrate and to identify the energy source of the energetic metal ions.\\ Magnetron plasmas are prone to a wide range of wave phenomena and instabilities. Especially, during HiPIMS at elevated power/current densities, symmetry breaks and self-organization in the plasma torus are observed. In this scenario localized travelling ionization zones with certain quasi-mode numbers are present which are commonly referred to as spokes. Because of their high rotation speed compared to typical process times of minutes their importance for thin film deposition was underestimated at first. Recent investigations show that spokes have a strong impact on particle transport, are probably the source of the high energetic metal ions and are therefore the essence of HiPIMS plasmas. In this contribution we will describe the current understanding of spokes, discuss implications for thin film synthesis and highlight open questions. [Preview Abstract] |
Monday, October 10, 2016 3:45PM - 4:15PM |
AM3.00009: Visualizing the ground state particle dynamics in HiPIMS discharges Invited Speaker: Nikolay Britun . [Preview Abstract] |
Monday, October 10, 2016 4:15PM - 4:45PM |
AM3.00010: Closing Remarks |
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