Bulletin of the American Physical Society
68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Volume 60, Number 9
Monday–Friday, October 12–16, 2015; Honolulu, Hawaii
Session UF3: Nonequilibrium Kinetics of Low-Temperature Plasmas
1:30 PM–3:00 PM,
Friday, October 16, 2015
Room: 305 AB
Chair: Julian Schulze, West Virginia University
Abstract ID: BAPS.2015.GEC.UF3.1
Abstract: UF3.00001 : Discussion on Electron Temperature of Low-Pressure Discharge Oxygen Plasma with Non-Maxwellian EEDF Based on Statistical Physics
1:30 PM–1:45 PM
Preview Abstract Abstract
Authors:
Hiroshi Akatsuka
(Tokyo Institute of Technology)
Yoshinori Tanaka
(Tokyo Institute of Technology)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.GEC.UF3.1
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700