Bulletin of the American Physical Society
66th Annual Gaseous Electronics Conference
Volume 58, Number 8
Monday–Friday, September 30–October 4 2013; Princeton, New Jersey
Session LW1: Plasma Etching
3:30 PM–5:30 PM,
Wednesday, October 2, 2013
Room: Ballroom I
Chair: Vincent Donnelly, University of Houston
Abstract ID: BAPS.2013.GEC.LW1.4
Abstract: LW1.00004 : Vacuum ultraviolet photon fluxes in argon-containing inductively coupled plasmas*
4:30 PM–4:45 PM
Preview Abstract Abstract
Authors:
S.B. Radovanov
(Applied Materials, Silicon Systems Group, Varian Semiconductor Equipment)
H.M. Persing
(Applied Materials, Silicon Systems Group, Varian Semiconductor Equipment)
S. Wang
(University of Wisconsin-Madison)
C.L. Culver
(University of Wisconsin-Madison)
J.B. Boffard
(University of Wisconsin-Madison)
C.C. Lin
(University of Wisconsin-Madison)
A.E. Wendt
(University of Wisconsin-Madison)
*This work was supported in part by NSF grant PHY-1068670.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2013.GEC.LW1.4
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