Bulletin of the American Physical Society
66th Annual Gaseous Electronics Conference
Volume 58, Number 8
Monday–Friday, September 30–October 4 2013; Princeton, New Jersey
Session LW1: Plasma Etching
3:30 PM–5:30 PM,
Wednesday, October 2, 2013
Room: Ballroom I
Chair: Vincent Donnelly, University of Houston
Abstract ID: BAPS.2013.GEC.LW1.2
Abstract: LW1.00002 : Photo-assisted etching of silicon in halogen-containing plasmas*
4:00 PM–4:15 PM
Preview Abstract Abstract
Authors:
Shyam Sridhar
(University of Houston)
Weiye Zhu
(University of Houston)
Lei Liu
(University of Houston)
Demetre Economou
(University of Houston)
Vincent Donnelly
(University of Houston)
*Work supported by DOE Plasma Science Center and NSF.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2013.GEC.LW1.2
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