Session ET4: Plasmas and Nanotechnology
2:00 PM–3:30 PM, Tuesday, November 15, 2011
Room: 255A
Chair: Masaru Hori, Nagoya University
Abstract ID: BAPS.2011.GEC.ET4.5
Abstract: ET4.00005 : Two dimensional fluid simulation in capacitively coupled silane discharges
3:15 PM–3:30 PM
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Abstract
Authors:
Yuan-Hong Song
(School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China)
Xiang-Mei Liu
(School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China)
Yan Wang
(School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China)
You-Nian Wang
(School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China)
A two-dimensional (2D) self-consistent fluid model is developed to describe the formation, subsequent growth, transport and charging mechanisms of nanoparticles in a capacitively coupled silane plasma. In this discharge process, large anions are produced by a series of chemical reactions of anions with silane molecules, while the lower limit of the initial nanoparticles are taken as large anions to directly link the coagulation module with the nucleation module. The influences of source parameters on the electron density, electron temperature, nanoparticle uniformity, and deposition rate, are carefully studied. Moreover, the behavior of silicon plasma mixed with SiH$_{4}$, N$_{2}$ and O$_{2}$ in a pulse modulated capacitively coupled plasma has been also investigated. Results showed a strong dependence of the electron density and electron temperature on the duty cycle and the modulated frequency.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2011.GEC.ET4.5