Bulletin of the American Physical Society
63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010; Paris, France
Session TF4: Plasma Diagnostics III: Reactive Plasmas
10:30 AM–12:30 PM,
Friday, October 8, 2010
Room: 151
Chair: Gilles Cunge, LTM-CNRS, Grenoble, France
Abstract ID: BAPS.2010.GEC.TF4.2
Abstract: TF4.00002 : Non-contact monitoring of Si substrate temperature during plasma etching using optical low-coherence interferometry
11:00 AM–11:15 AM
Preview Abstract Abstract
Authors:
Takayuki Ohta
(Faculty of Systems Engineering, Wakayama University)
Chishio Koshimizu
(Yamanashi Technology Development Center, Tokyo Electron AT)
Shigeki Tuchitani
(Faculty of Systems Engineering, Wakayama University)
Masufumi Ito
(Faculty of Science and Technology, Meijo University)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.GEC.TF4.2
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