Bulletin of the American Physical Society
63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
Volume 55, Number 7
Monday–Friday, October 4–8, 2010; Paris, France
Session ET3: Plasma Deposition I
4:00 PM–6:00 PM,
Tuesday, October 5, 2010
Room: 262
Chair: Y. Setsuhara, Osaka University
Abstract ID: BAPS.2010.GEC.ET3.5
Abstract: ET3.00005 : Effect of dual HiPIMS discharge parameters on formation and crystallography of antimicrobial Ti-Cu films
5:00 PM–5:15 PM
Preview Abstract Abstract
Authors:
Rainer Hippler
(University of Greifswald, Germany)
Vitezslav Stranak
(University of Greifswald, Germany)
Harm Wulff
(University of Greifswald, Germany)
Robert Bogdanowicz
(University of Greifswald, Germany)
Zdenek Hubicka
(Academy of Sciences of the Czech Rep., Institute of Physics, Prague)
Carmen Zietz
(University of Rostock, Germany)
Rainer Bader
(University of Rostock, Germany)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.GEC.ET3.5
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