Session DT1: Plasma-Surface Interactions

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Abstracts
Chair: CW Chung, Hanyang University, Korea
- Salon E


Tuesday, October 14, 2008
1:30PM - 2:00PM

DT1.00001: Study of elementary processes of plasma-wall interaction in fusion devices by means of an inductively coupled hydrogen plasma in interaction with graphite surfaces
Invited Speaker: Gilles Cartry

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Tuesday, October 14, 2008
2:00PM - 2:15PM

DT1.00002: Manipulation of the bombarding ion energy distribution in fluorocarbon plasma etching
Amy Wendt , Frank Buzzi , Yuk-Hong Ting

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Tuesday, October 14, 2008
2:15PM - 2:30PM

DT1.00003: Atomic-scale cellular model and profile simulation of Si etching in chlorine- and bromine-containing plasmas: Effects of surface oxidation on evolution of feature profiles
Hirotaka Tsuda , Shoki Irie , Masahito Mori , Hiroaki Ohta , Koji Eriguchi , Kouichi Ono

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Tuesday, October 14, 2008
2:30PM - 2:45PM

DT1.00004: Mechanistic model of atomic recombination
J.D. Guha , V.M. Donnelly

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Tuesday, October 14, 2008
2:45PM - 3:00PM

DT1.00005: Surface loss rate of H and N radicals in H$_{2}$/N$_{2}$ plasma etching process
Chang Sung Moon , Keigo Takeda , Toshio Hayashi , Seigo Takashima , Makoto Sekine , Yuichi Setsuhara , Masaharu Shiratani , Masaru Hori

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Tuesday, October 14, 2008
3:00PM - 3:15PM

DT1.00006: ABSTRACT WITHDRAWN


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Tuesday, October 14, 2008
3:15PM - 3:30PM

DT1.00007: Effects of Remote Plasma Treatment on Surface Defects in ZnO Nanopowders
Jorge Paramo , Raul Peters , Yuri Strzhemechny

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