Friday, October 17, 2008
10:00AM - 10:30AM
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WF3.00001: Numerical Simulation on the Profile of Plasma and Radicals in Plasma Chambers
Invited Speaker:
Ikuo Sawada
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Friday, October 17, 2008
10:30AM - 10:45AM
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WF3.00002: ABSTRACT WITHDRAWN
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Friday, October 17, 2008
10:45AM - 11:00AM
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WF3.00003: Quantitative improvement in MD-based plasma etching simulator: Si etching by halogen-including plasmas
Hiroaki Ohta
, Tatsuya Nagaoka
, Akira Iwakawa
, Koji Eriguchi
, Kouichi Ono
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Friday, October 17, 2008
11:00AM - 11:15AM
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WF3.00004: Finite volume formulation of low-temperature plasma equations and numerical solution in one dimension
Mirko Vukovic
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Friday, October 17, 2008
11:15AM - 11:45AM
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WF3.00005: 3-Dimensional Modeling of Capacitively and Inductively Coupled Plasma Etching Systems
Invited Speaker:
Shahid Rauf
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Friday, October 17, 2008
11:45AM - 12:00PM
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WF3.00006: Prediction of SiO$_{2}$ etching profile under the presence of RIE-lag effect
Takashi Yagisawa
, Toshiaki Makabe
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