Thursday, October 16, 2008
8:00AM - 8:30AM
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PR1.00001: Study of the ion induced etching for Si and SiO2 with F+ and CFX(X=1,2,3)+ ions
Invited Speaker:
Kazuhiro Karahashi
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Thursday, October 16, 2008
8:30AM - 8:45AM
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PR1.00002: Initial Formation of Carbon Nanowalls Synthesized by Ar Ions and CF$_{X}$/H Radicals
Shingo Kondo
, Olivera Stepanovic
, Makoto Sekine
, Masaru Hori
, Koji Yamakawa
, Shoji Den
, Mineo Hiramatsu
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Thursday, October 16, 2008
8:45AM - 9:00AM
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PR1.00003: Critical roles of CF$_{4}$ and SiCl$_{4}$ plasma treatments on AlGaN/GaN transistor performance
Anirban Basu
, Ilesanmi Adesida
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Thursday, October 16, 2008
9:00AM - 9:15AM
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PR1.00004: On the effect of additional CF$_2$ scattering data on a CF$_4$/O$_2$ plasma etch simulation
James J. Munro
, Natasha Doss
, Jonathan Tennyson
, Song-Yun Kang
, Masato Kawakami
, Sumie Segawa
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Thursday, October 16, 2008
9:15AM - 9:30AM
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PR1.00005: Li$^{+}$ attachment mass spectrometric investigation of high-mass neutral species in the downstream region of Ar/CF$_{4}$, Ar/CF$_{4}$/O$_{2}$ and Ar/CF$_{4}$/H$_{2}$ plasmas
Kenji Furuya
, Hiroshi Okumura
, Yuji Tamai
, Akihiro Ide
, Akira Harata
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