Bulletin of the American Physical Society
61st Annual Gaseous Electronics Conference
Volume 53, Number 10
Monday–Friday, October 13–17, 2008; Dallas, Texas
Session WF3: Computational Methods for Plasmas
10:00 AM–12:00 PM,
Friday, October 17, 2008
Room: Addison Room
Chair: J.P. Boeuf, LAPLACE, CNRS - University of Toulouse
Abstract ID: BAPS.2008.GEC.WF3.3
Abstract: WF3.00003 : Quantitative improvement in MD-based plasma etching simulator: Si etching by halogen-including plasmas
10:45 AM–11:00 AM
Preview Abstract Abstract
Authors:
Hiroaki Ohta
Tatsuya Nagaoka
Akira Iwakawa
Koji Eriguchi
Kouichi Ono
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2008.GEC.WF3.3
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