Bulletin of the American Physical Society
61st Annual Gaseous Electronics Conference
Volume 53, Number 10
Monday–Friday, October 13–17, 2008; Dallas, Texas
Session WF1: Plasma Diagnostics II
10:00 AM–12:00 PM,
Friday, October 17, 2008
Room: Salon E
Chair: M. Goeckner, The University of Texas at Dallas
Abstract ID: BAPS.2008.GEC.WF1.4
Abstract: WF1.00004 : Application of an RF Biased Langmuir Probe to Etch Reactor Chamber Matching, Fault Detection and Process Control
10:45 AM–11:00 AM
Preview Abstract Abstract
Authors:
Douglas Keil
(Lam Research Corporation)
Jean-Paul Booth
(Lam Research Corporation)
Neil Benjamin
(Lam Research Corporation)
Chris Thorgrimsson
(Lam Research Corporation)
Mitchell Brooks
(Lam Research Corporation)
Mikio Nagai
(Lam Research Corporation)
Luc Albarede
(Lam Research Corporation)
Jung Kim
(Lam Research Corporation)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2008.GEC.WF1.4
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700