Bulletin of the American Physical Society
61st Annual Gaseous Electronics Conference
Volume 53, Number 10
Monday–Friday, October 13–17, 2008; Dallas, Texas
Session RR1: Material Processing I
1:30 PM–3:15 PM,
Thursday, October 16, 2008
Room: Salon E
Chair: P. Kothnur, Novellus Systems, Inc
Abstract ID: BAPS.2008.GEC.RR1.6
Abstract: RR1.00006 : Control of deposition profile of plasma CVD hard carbon films on substrates with trenches
2:45 PM–3:00 PM
Preview Abstract Abstract
Authors:
Masaharu Shiratani
(Kyushu University, JST, CREST)
Jun Umetsu
(Kyushu University)
Kazuhiko Inoue
(Kyushu University)
Takuya Nomura
(Kyushu University)
Hidefumi Matsuzaki
(Kyushu University)
Kazunori Koga
(Kyushu University, JST, CREST)
Yuichi Setsuhara
(Osaka University, JST, CREST)
Makoto Sekine
(Nagoya University, JST, CREST)
Masaru Hori
(Nagoya University, JST, CREST)
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2008.GEC.RR1.6
Follow Us |
Engage
Become an APS Member |
My APS
Renew Membership |
Information for |
About APSThe American Physical Society (APS) is a non-profit membership organization working to advance the knowledge of physics. |
© 2024 American Physical Society
| All rights reserved | Terms of Use
| Contact Us
Headquarters
1 Physics Ellipse, College Park, MD 20740-3844
(301) 209-3200
Editorial Office
100 Motor Pkwy, Suite 110, Hauppauge, NY 11788
(631) 591-4000
Office of Public Affairs
529 14th St NW, Suite 1050, Washington, D.C. 20045-2001
(202) 662-8700