Friday, October 5, 2007
8:00AM - 8:30AM
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VF1.00001: Reaction of Fluorocarbon Species with Si and SiO$_{2}$ Surfaces
Invited Speaker:
Hirotaka Toyoda
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Friday, October 5, 2007
8:30AM - 8:45AM
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VF1.00002: Modeling high aspect ratio contact etch of SiO$_{2}$
Phillip Stout
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Friday, October 5, 2007
8:45AM - 9:00AM
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VF1.00003: Time dependence analysis of the 3D profile charging during $SiO_2$ etching in $Ar^{+}$/$CF_4$ plasma
Branislav Radjenovic
, Marija Radmilovic-Radjenovic
, Zoran Petrovic
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Friday, October 5, 2007
9:00AM - 9:15AM
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VF1.00004: Plasma Modeling for Cu barrier/seed applications
Prashanth Kothnur
, Ananth Bhoj
, Ron Kinder
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Friday, October 5, 2007
9:15AM - 9:30AM
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VF1.00005: Spatial distributions of Cu particulates in high-pressure magnetron sputtering plasmas studied by laser light scattering
N. Nafarizal
, N. Takada
, K. Sasaki
, M. Ikeda
, Y. Sago
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Friday, October 5, 2007
9:30AM - 9:45AM
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VF1.00006: Multi-hollow discharge plasma CVD reactor with magnets for highly stable a-Si:H film deposition
Kazunori Koga
, William M. Nakamura
, Hiroshi Satou
, Hiroomi Miyahara
, Masaharu Shiratani
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Friday, October 5, 2007
9:45AM - 10:00AM
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VF1.00007: Control of structures of Carbon Nanowalls in plasma enhanced CVD
Wakana Takeuchi
, Yutaka Tokuda
, Mineo Hiramatsu
, Hiroyuki Kano
, Masaru Hori
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