Session RW1: Capacitively Coupled Plasmas

Chair: P. Chabert, Ecole Polytechnique, France
Doubletree Hotel - Pine

Wednesday, October 19, 2005
1:30PM - 1:45PM

 RW1.00001: Breakdown in dual frequency capacitive discharges
Miles M. Turner

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Wednesday, October 19, 2005
1:45PM - 2:00PM

 RW1.00002: Phase resolved optical emission spectroscopy on a dual frequency capacitively coupled rf discharge
Timo Gans , Julian Schulze , Uwe Czarnetzki , Miles M. Turner

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Wednesday, October 19, 2005
2:00PM - 2:15PM

 RW1.00003: Frequency dependent spatial distributions of the electrons in a 300 mm diameter VHF capacitively coupled plasmas
Greg Hebner , E. Barnat , P. Miller , A. Paterson , J. Holland , T. Lill

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Wednesday, October 19, 2005
2:15PM - 2:30PM

 RW1.00004: $E$ to $H$ transition in very high frequency capacitive discharges.
Pierre Levif , Pascal Chabert , Jean-Luc Raimbault , Jean-Marcel Rax , Michael A. Lieberman

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Wednesday, October 19, 2005
2:30PM - 3:00PM

 RW1.00005: PIC and fluid simulations of capacitively coupled plasmas for dielectric etchers and microplasmas
Invited Speaker: Jae Koo Lee

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Wednesday, October 19, 2005
3:00PM - 3:30PM

 RW1.00006: Analysis of Triple-Frequency Capacitive Systems for Plasma Processing
Invited Speaker: Dan Hoffman

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Session RW2: Biological Applications of Plasmas

Chair: Uwe Kortshagen, University of Minnesota
Doubletree Hotel - Cedar

Wednesday, October 19, 2005
1:30PM - 2:00PM

 RW2.00001: Biological Application of Plasma: Sterilization, Surface Treatment, and Tissue Engineering
Invited Speaker: Alexander Fridman

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Wednesday, October 19, 2005
2:00PM - 2:30PM

 RW2.00002: Electron attachment to molecules of biological relevance
Invited Speaker: Verena Grill

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Wednesday, October 19, 2005
2:30PM - 2:45PM

 RW2.00003: Spatial and Temporal Behavior of Repetitive Plasma Discharges in Saline Solutions
Kenneth Stalder , Gagik Nersisyan , William Graham

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Wednesday, October 19, 2005
2:45PM - 3:00PM

 RW2.00004: Electron-impact total ionization cross sections of DNA sugar-phosphate backbone and an additivity principle
Winifred Huo , Christopher Dateo

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